Insulating film and method for preparing the same
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsYasuo Takebe, Tadashi Ootake, Norihisa Mino, Hiroaki Takezawa
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Abstract
An electrically insulating film capable of maintaining a preferable insulating property even with a film thickness of only some μand a method for preparing the same are disclosed. The insulating film comprises a first layer formed on a surface of a conductor substrate of a transition metal and comprised of molecules fixed on the surface of the conductor substrate through chemical bonds such as transition metal-sulfur bonds or chelate bonds, and a second layer formed on the first layer and comprised of a resin bonded to the molecules of the first layer through covalent bonds.
Claims4
An electrically insulating film comprising:
- a first layer formed on a surface of a conductor substrate of a transition metal, said first layer consisting essentially of monomer molecules fixed on the surface of said conductor substrate through transition metal-sulfur bonds represented by the formula (1)
- M—S— (1)
- wherein M represents the transition metal and S represents sulfur, and
- a second layer formed on said first layer and comprised of a resin bonded to the molecules of said first layer through covalent bonds.
An electrically insulating film comprising:
- a first layer formed on a surface of a conductor substrate of a transition metal, said first layer being comprised of molecules fixed on the surface of said conductor substrate through chelate bonds selected from the groups represented by the formula (2)
- wherein M represents the transition metal, and
- a second layer formed on said first layer and comprised of a resin bonded to the molecules of said first layer through covalent bonds.
Dependencies are inferred from the claim text.