Optical single crystal film process for producing the same and optical element comprising the same
AssigneeNGK Insulators, Ltd.
InventorsTatsuo Kawaguchi, Minoru Imaeda
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Abstract
In producing an optical single crystal epitaxial film from a melt containing a transition metal on a single crystal substrate by a liquid phase epitaxial method, this process contains the steps of: annealing the film at a predetermined temperature in an ozonic atmosphere; and temperature-increasing and -decreasing to and from the predetermined temperature, wherein at least one of temperature-increasing and -decreasing steps, the film is exposed to a substantially ozone-free atmosphere.
Claims5
An optical single crystal film comprising an epitaxial film formed on a single crystal substrate by a liquid phase epitaxial process from a melt comprising V2O5 and Li2O, said epitaxial film having been subjected to an annealing treatment in an atmosphere which contains ozone and having an optical absorption coefficient of not more than 2.0 cm−1 for a light having a wavelength of about 450 nm.
An optical element comprising:
- a ferroelectric optical single crystal substrate subjected to a single poling treatment;
- and
- a ferroelectric optical single crystal film grown on the ferroelectric optical single crystal substrate by liquid phase epitaxy from a melt containing a transition element, and then annealed in an ozonic atmosphere;
- wherein said film has an extraordinary index larger than that of said substrate and an optical propagation loss at a wavelength of about 450 nm of not more than 5 dB/cm.
Dependencies are inferred from the claim text.