# US 6,202,000 B1 · Monitoring system for semiconductor device fabrication facility > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 6,202,000 B1 - Document ID: US6202000B1 - Status: Granted - Kind: B1 - Application number: 09/168,092 - Filed: 1998-10-08 - Granted: 2001-03-13 - Earliest claimed: 1997-12-30 - Assignees: Samsung Electronics Co., Ltd. - Inventors: Byeong-ki Rheem - Web page: https://patentgrep.com/patent/US6202000B1 ## CPC - G05B 23/027: {Alarm generation, e.g. communication protocol; Forms of alarm} - G05B 2219/2223: Use a different frequency to address each processor - G05B 2223/06: Remote monitoring - G05B: CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS (systems for controlling or regulating non-electric variables G05D; systems for regulating electric or magnetic variables G05F; control devices or systems insofar as characterised by mechanical features only G05G) ## Abstract There is provided a monitoring system for monitoring semiconductor device fabrication facilities by allocating a specific frequency on each of the semiconductor device fabrication facilities, and connecting between each of the facilities and a central monitoring apparatus with information transmission line and selective signal line thereby simplifying the monitoring lines. The monitoring system comprises: a central monitoring apparatus outputting a signal having a specific frequency for selecting an object to be monitored via a selective signal line, and receiving the information transferred via an information transmission line from the object responsive to the specific frequency signal; and a plurality of semiconductor device fabrication facilities each of which is connected to the selective signal line and the information transmission line in parallel with a specific frequency for response allocated for each of them, and outputs a specific information received from its corresponding process via the information transmission line if it is selected by the select signal transmitted via the selective signal line to have its corresponding frequency. ## Claims ### Claim 1 A monitoring system for semiconductor device fabrication facilities comprising: a central monitoring apparatus outputting, via a selective signal line, a select signal having a specific frequency for selecting an object to be monitored, and receiving information transferred via an information transmission line from the object responsive to the select signal having the specific frequency; and a plurality of semiconductor device fabrication facility monitors, each having a corresponding predetermined frequency for response, and each of said monitors being connected in parallel to the selective signal line and the information transmission line, and outputting said information, received from a process of a corresponding device fabrication facility, via the information transmission line if and when said monitor is selected by the select signal transmitted via the selective signal line having the specific frequency matching the corresponding predetermined frequency. ### Claim 2 (depends on 1) The monitoring system for semiconductor device fabrication facilities of the claim 1, wherein the central monitoring apparatus comprises: an output determining means for designating the specific frequency of the select signal; a frequency generating means comprising a plurality of frequency generators each generating a unique frequency signal, said frequency generating means successively outputting each of said unique frequency signals as an output signal; an outputting means for receiving the output signal from the frequency generating means and transmitting said signal as the select signal via the selective signal line; an inputting means for receiving the information via the information transmission line; and a displaying means for displaying a response according to the information received from the inputting means. ### Claim 3 (depends on 2) The monitoring system for semiconductor device fabrication facilities of claim 2, wherein the output determining means comprises: a first oscillating part for generating and outputting a first pulse signal; a counter for performing a binary count of the first pulse signal and outputting a binary count signal; and an encoder for receiving the binary count signal and for providing a plurality of Enable signals for selecting, in a specific order according to the binary count signal, one of the plurality of frequency generators to selectively output the output signal. ### Claim 4 (depends on 2) The monitoring system for semiconductor device fabrication facilities of claim 2, wherein the outputting means comprises a plurality of first 3-state buffers each corresponding to one of the frequency generators, each of said first 3-state buffers having an Enable input connected with one of the plurality of Enable signals output from the output-determining means. ### Claim 5 (depends on 2) The monitoring system for semiconductor device fabrication facilities of the claim 2, wherein the inputting means comprises: a plurality of second 3-state buffers each corresponding to one of the frequency generators, each of said second 3-state buffers having an input connected with the information transmission line, a corresponding Enable input connected with one of a plurality of Enable signals output from the output-determining means, and an output for outputting an output signal comprising the information signal when said corresponding Enable input is enabled by the output-determining means; a second oscillating part which outputs a second pulse signal; and a latch which receives the output signals from said second 3-state buffers and outputs said output signals after a delay period corresponding to the second pulse signal. ### Claim 6 (depends on 5) The monitoring system for semiconductor device fabrication facilities of claim 5, wherein the displaying means comprises a plurality of lamps, each receiving one of the plurality of output signals from said latch corresponding to one of said plurality of second 3-state buffers, and wherein each lamp is turned on and off responsive to said output signal. ### Claim 7 (depends on 1) The monitoring system for semiconductor device fabrication facilities of claim 1, wherein the central monitoring apparatus is operated by outputting the select signal via the selective signal line, varying the specific frequency of the select signal, and selecting a semiconductor device facility corresponding to the select signal via the information transmission line. ### Claim 8 (depends on 7) The monitoring system for semiconductor device fabrication facilities of claim 7, wherein the central monitoring apparatus comprises: an output determining means for randomly designating the frequency of the select signal; a frequency generating means equipped with a plurality of frequency generators each generating a unique frequency signal, said frequency generating means randomly outputting each of said unique frequency signals as an output signal; an outputting means for receiving the output signal from the frequency generating means and transmitting said signal as the select signal via the selective signal line; an inputting means for receiving the information transmitted via the information transmission line; and a displaying means for displaying a response according to the information received from the inputting means. ### Claim 9 (depends on 8) The monitoring system for semiconductor device fabrication facilities of the claim 8, wherein the output-determining means comprises: a designation signal input means for supplying an encoder select signal for randomly selecting one of the frequency generators; and an encoder for receiving the encoder select signal and for providing a plurality of Enable signals for selecting, according to the encoder select signal, one of the plurality of frequency generators to selectively output the output signal. ### Claim 10 (depends on 9) The monitoring system for semiconductor device fabrication facilities of the claim 9, wherein the designation signal input means comprises an input part for inputting a key signal. ### Claim 11 (depends on 9) The monitoring system for semiconductor device fabrication facilities of claim 9, wherein the designation signal input means comprises a host computer. ### Claim 12 (depends on 8) The monitoring system for semiconductor device fabrication facilities of claim 8, wherein the outputting means comprises a plurality of first 3-state buffers each corresponding to one of the frequency generators, each of said first 3-state buffers having an Enable input connected with one of the plurality of Enable signals output from the output-determining means. ### Claim 13 (depends on 8) The monitoring system for semiconductor device fabrication facilities of claim 8, wherein the inputting means comprises: a plurality of second 3-state buffers each corresponding to one of the frequency generators, each of said second 3-state buffers having an input connected with the information transmission line, a corresponding Enable input connected with one of a plurality of Enable signals output from the output-determining means, and an output for outputting an output signal comprising the information signal when said corresponding Enable input is enabled by the output-determining means; an oscillating part which outputs a pulse signal; and a latch which receives the output signals from said second 3-state buffers and outputs said output signals after a delay period corresponding to the second pulse signal. ### Claim 14 (depends on 8) The monitoring system for semiconductor device fabrication facilities of claim 8, wherein the displaying means comprises a plurality of lamps, each receiving one of the plurality of output signals from said latch corresponding to one of said plurality of second 3-state buffers, and wherein each lamp is turned on and off responsive to said output signal. ### Claim 15 (depends on 1) The monitoring system for semiconductor device fabrication facilities of the claim 1, wherein the semiconductor device fabrication facility monitor comprises: a switching means receiving a sensing signal from a sensor; and a filtering means for transferring the sensing signal from the switching means to the information transmission line when and if the specific frequency of the select signal applied from the central monitoring apparatus via the selective signal line is identical to the predetermined frequency. ### Claim 16 (depends on 15) The monitoring system for semiconductor device fabrication facilities of the claim 15, wherein the filtering means comprises: a frequency filter for determining if the specific frequency of the select signal is identical to the predetermined frequency and outputting a filter output signal in response thereto; and a switch for receiving the filter output signal and for selectively transferring the signal from the switching means to the information transmission line responsive to the filter output signal.