Method and apparatus for manufacturing semiconductor device
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsItaru Kanno, Tetsuo Aoyama, Mayumi Hada
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Abstract
In a method of manufacturing a semiconductor device including a capacitor, a refractory metal layer is dry-etched using a resist pattern as a mask, whereby a first electrode pattern formed of refractory metal is provided. Sidewall of the first electrode pattern is cleaned using aqueous solution of a surface active agent. Through this procedure, etching residue formed on the sidewall of the electrode pattern is removed when the electrode pattern of refractory metal is produced through dry etching method.
Claims8
An apparatus for manufacturing a semiconductor device, comprising:
- a cleaning tank;
- an aqueous solution of a surface active agent in said cleaning tank;
- wafer transport means for carrying a wafer in said cleaning tank;
- an ultrasonic wave generator placed in said cleaning tank for generating ultrasonic waves in said cleaning tank;
- a reflection board placed in said cleaning tank for reflecting ultrasonic wave generated from said ultrasonic wave generator;
- and
- reflection board vibration means for vibrating said reflection board in said cleaning tank.
An apparatus for manufacturing a semiconductor device, comprising:
- a cleaning tank;
- an aqueous solution of a surface active agent in said cleaning tank;
- wafer transport means for carrying a wafer in said cleaning tank;
- an ultrasonic wave generator placed in said cleaning tank for generating ultrasonic waves in said cleaning tank;
- a reflection board placed in said cleaning tank for reflecting ultrasonic wave generated from said ultrasonic wave generator;
- and
- wafer vibration means for vibrating said wafer in an upward and downward direction in said cleaning tank;
- wherein the ultrasonic waves comprise standing waves having a standing wave interval, and the wafer vibration unit is for vibrating the wafer with an amplitude of vibration equal to or greater than the standing wave interval.
An apparatus for manufacturing a semiconductor device, comprising:
- a cleaning tank;
- an aqueous solution of a surface active agent in said cleaning tank;
- wafer transport means for carrying a wafer in said cleaning tank;
- an ultrasonic wave generator placed in said cleaning tank for generating ultrasonic waves in said cleaning tank;
- reflection board placed in said cleaning tank for reflecting ultrasonic wave generated from said ultrasonic wave generator;
- and
- generator vibration means for vibrating said ultrasonic wave generator in said cleaning tank.
Dependencies are inferred from the claim text.