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AssigneeInternational Business Machines Corporation
InventorsRaul Edmundo Acosta, Michael James Cordes, Steven Alan Cordes
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In the invention a pellicle mounting structural principle is provided whereby a membrane for protection of an X-ray mask is interchangeably positioned with proper spacing between the X-ray mask and the resist on the wafer in which the pattern produced by the X-ray exposure is to be formed. The mounting principle employs a combined assembly of, a membrane and spacer member subassembly together with a means for seectably separable retention to the supporting structural portion of the mask The principle accommodates membrane materials that may not be flexible and provides an ability to remove the membrane for cleaning or replacement and to removal and reassembly with ease in reestablishing the spacing with respect to the mask. The means for the selectably separable retention to the supporting structural portion of the mask involves the use of springs and elastomers, securing to the sides of the supporting structural mask ring and the bonding of the spacer member directly to the mask.
A pellicle member for protection of an X-ray exposure area absorber pattern that is positioned on and that extends a distance from a surface of a circular X-ray mask having an outside diameter and a support ring with a shoulder extending beyond said outside diameter, comprising in combination:
In a pattern reproduction mask for use with X-rays wherein a circular bulk mask support member having first and second essentially parallel surfaces is supported at the periphery by a ring member, said bulk mask support member having a central thinned region in said first surface and having an absorber pattern of X-ray opaque material on said second surface in registration with said thinned region, the improvement comprising:
Dependencies are inferred from the claim text.