Low “K” factor hybrid photoresist
AssigneeInternational Business Machines Corporation
InventorsSteve J. Holmes, Ahmad D. Katnani, Niranjan M. Patel, Paul A. Rabidoux
Life of this patent
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Abstract
A photoresist having both positive and negative tone components resulting in a lower “k” factor than the single tone photoresist is disclosed. The hybrid resist may either have the negative tone resist or the positive tone resist as the major portion, while the other tone is a relatively minor portion. For examples, a positive tone resist may include a minor portion of a negative tone cross-linker or a negative tone resist may include positively acting functional groups. The hybrid resist of the present invention allows for wider exposure dosage windows, therefore increasing the yield or performance and line density.
Claims10
An enhanced resist composition comprising:
- a photoresist material having blocking groups that are induced by a single excitation event to deblock;
- and
- a cross-linker,
- wherein the composition is initially soluble in aqueous base;
- wherein both the cross-linker and the blocking groups are induced to respond by a single excitation event;
- wherein the amount of blocking groups is less than the amount required to keep the composition soluble in aqueous base after cross-linking occurs;
- and
- wherein the composition is rendered aqueous base insoluble after cross-linking even though the solubility of the exposed composition is increased by the blocking group response.
Dependencies are inferred from the claim text.