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US 6,190,807 B1Granted
Mask compatible with different steppers
AssigneeUnited Integrated Circuits Corp.
InventorsYuang-Cheng Wang, Chii-Ming Shiah
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Abstract
A mask includes a piece of reticle glass, a chromium thin film, a pre-alignment mark, a first alignment mark, a second alignment mark, a first identification barcode, and a second identification barcode. There is also a pellicle flame formed on the chromium thin film to prevent the patterning defects caused by particles. The mask of the invention is compatible with an ASML stepper and a Nikon stepper
Claims7
A mask compatible with a first stepper and a second stepper, wherein the first stepper is different from the second stepper, the mask comprising:
- a piece of reticle glass, wherein the piece of reticle glass has a central point, a upper edge and a lower edge;
- a chromium thin film formed on the central portion of the piece of reticle glass;
- a pre-alignment mark for performing a pre-alignment process on the first stepper;
- a first alignment mark for performing an alignment process on the first stepper;
- a second alignment mark for performing an alignment process on the second stepper, wherein the second alignment mark has a dimension;
- a first identification barcode for performing an alignment process on the first stepper;
- and
- a second identification barcode for performing an alignment process on the second stepper.
5 more elements
Dependencies are inferred from the claim text.