Polishing composition
AssigneeFujimi Incorporated
InventorsKeigo Ohashi, Hitoshi Kodama, Noritaka Yokomichi
Life of this patent
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Abstract
A polishing composition for polishing a memory hard disk, which comprises water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide and which further contains an iron chelate complex dissolved in the composition, the iron chelate complex having a nitrogen-containing compound as a ligand, and the pH of the entire composition being from 6 to 10.
Claims8
A method for preparing a memory hard disk, which comprises polishing a memory hard disk substrate with a polishing composition which comprises water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide and which further contains an iron chelate complex dissolved in the composition, the iron chelate complex having a nitrogen-containing compound as a ligand, and the entire composition having a pH of from 6 to 10, wherein the substrate is selected from the group consisting of Ni—P Ni—Fe, aluminum, boron carbide, and carbon.
Dependencies are inferred from the claim text.