Polishing pad, method and apparatus for treating polishing pad and polishing method
AssigneeShin-Etsu Handotai Co., Ltd.
InventorsKoichi Tanaka, Koji Morita, Tsutomu Takaku
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Abstract
A polishing pad for pressing a work to be polished to a surface thereof, includes a structure obtained by being compressed under a temperature which is higher than an operating temperature for polishing the work and/or under a pressure which is equal or higher than an operating pressure for polishing the work. A method for polishing a includes the step of polishing the work by using the polishing pad.
Claims19
A polishing pad for pressing a work to be polished to a surface of the polishing pad, wherein:
- the polishing pad comprising unwoven cloth impregnated with polyurethane and having a continuous foamed structure in which spaces between fibers are continuous, and
- the polishing pad having a compressed structure obtained by compressing the polishing pad under one of the following conditions:
- (a) a temperature that is higher than an operating temperature for polishing the work, (b) a pressure that is equal to an operating pressure for polishing the work, or (c) a pressure that is higher than the operating pressure for polishing the work.
A method for treating a polishing pad to be adhered to a turn table, for pressing a work to be polished to a surface of the polishing pad, the method comprising:
- compressing the polishing pad under one of the following conditions:
- (a) a temperature that is higher than an operating temperature for polishing the work, (b) a pressure that is equal to an operating pressure for polishing the work, or (c) a pressure that is higher than the operating pressure for polishing the work,
- wherein the polishing pad comprising unwoven cloth impregnated with polyurethane and having a continuous foamed structure in which spaces between fibers are continuous.
A method for polishing a work, comprising:
- compressing a polishing pad under a condition selected from the group consisting of (a) a temperature that is higher than an operating temperature for polishing the work, (b) a pressure that is equal to or higher than an operating pressure for polishing the work, and (c) a temperature that is higher than the operating temperature for polishing the work and a pressure that is equal to or greater than the operating pressure for polishing the work, wherein the polishing pad comprising unwoven cloth impregnated with polyurethane and having a continuous foamed structure in which spaces between fibers are continuous;
- adhering the polishing pad on a turn table;
- and polishing the work with the polishing pad.
Dependencies are inferred from the claim text.