Using ion implantation to create normal layers in superconducting-normal-superconducting Josephson junctions
AssigneeTRW Inc.
InventorsJohn R. LaGraff, James M. Murduck, Hugo W-K. Chan
Life of this patent
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AssigneeTRW Inc.
InventorsJohn R. LaGraff, James M. Murduck, Hugo W-K. Chan
Estimating the term…
A SNS Josephson junction (10) is provided for use in a superconducting integrated circuit. The SNS junction (10) includes a first high temperature superconducting (HTS) layer (14) deposited and patterned on a substrate (18), such that the first HTS layer (14) is selectively removed to expose a top surface of the substrate (18) as well as to form an angular side surface (22) on the first HTS layer (14) adjacent to the exposed top surface of the substrate (18). Ion implantation is used to form a junction region (12) having non-superconducting properties along the angular side surface (22) of the first HTS layer (14). A second HTS layer (16) is then deposited and patterned over at least a portion of the first HTS layer (14) and the exposed top surface of the substrate (18), thereby forming a SNS Josephson junction.
A method for fabricating a superconducting-normal-superconducting (SNS) junction for use in a superconducting integrated circuit, comprising the steps of:
A method for fabricating a superconducting-normal-superconducting (SNS) junction for use in a superconducting integrated circuit, comprising the steps of:
A superconducting-normal-superconducting (SNS) junction formed on a substrate for use in a superconducting integrated circuit, comprising;
Dependencies are inferred from the claim text.