Cleaning compositions for hard surfaces containing naphthalene sulfonic acid/formaldehyde condensates
AssigneeHenkel Kommandigesellschaft Auf Aktien (KGaA)
InventorsThomas Moeller, Heinz-Dieter Soldanski, Stefanie Kuech, Juergen Noglich
Life of this patent
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Abstract
Naphthalene sulfonic acid/formaldehyde condensates (i) may be used in a composition for cleaning hard surfaces to reduce the rain effect and/or the film effect, (ii) may be present in a cleaning composition for hard surfaces in combination with one or more other anionic and/or nonionic surfactants and (iii) may be used in a process for reducing the rain effect and/or the film effect on a hard surface treated with a liquid cleaning composition, the surface being treated with a liquid cleaning composition in concentrated or diluted form containing one or more naphthalene sulfonic acid/formaldehyde condensates.
Claims17
An aqueous composition, having a pH of from 6 to 12 , for cleaning hard surfaces and to reduce at least one of a rain effect and a film effect comprising:
- (a) 0.001% to 20% by weight of napthalene sulfonic acid/formaldehyde condensates;
- (b) 0.01% to 10% by weight of at least one anionic surfactant other than naphthalene sulfonic acid/formaldehyde condensate;
- (c) 0.001% to 3% by weight of at least one nonionic surfactant;
- (d) 0.1% to 50% by weight of at least one water soluble organic solvent selected from the group consisting of lower alcohols and lower ether alcohols;
- (e) optionally at least one member selected from the group consisting of monocarboxylic acids, dicarboxylic acids, polycarboxylic acids each containing up to six carbon atoms, viscosity regulators, dyes, perfume, pH regulators, preservatives, complexing agents for alkaline earth metal ions, enzymes, bleaching systems, antistatic agents, volatile alkali and additives, other than the naphthalene sulfonic acid/formaldehyde condensates, which reduces at least one of the rain effect and the film effect;
- and
- (f) water.
Dependencies are inferred from the claim text.