Method of forming a semiconductor device for a light valve
AssigneeSeiko Instruments Inc.
InventorsHiroaki Takasu, Yoshikazu Kojima, Kunihiro Takahashi, Tsuneo Yamazaki, Tadao Iwaki
Life of this patent
Estimating the term…
Loading patent…
AssigneeSeiko Instruments Inc.
InventorsHiroaki Takasu, Yoshikazu Kojima, Kunihiro Takahashi, Tsuneo Yamazaki, Tadao Iwaki
Estimating the term…
A semiconductor substrate is utilized to integrally form a drive circuit and a pixel array to produce a transparent semiconductor device for a light valve. The semiconductor device for a light valve is constructed of a semiconductor substrate composed of a bulk single crystal silicon having an opaque thick portion and a thin transparent portion. A pixel array is formed in the transparent portion. A drive circuit is formed in a top face of the opaque portion. A transparent support substrate is laminated to the top face of the semiconductor substrate for reinforcement. A bulk portion of the semiconductor substrate is removed from a back face thereof by selective etching to provide the transparent portion.
A method of producing a semiconductor device for a light valve, comprising the steps:
A method of producing a semiconductor device for a light valve, comprising the steps:
Dependencies are inferred from the claim text.