Method of making field emitters using porous silicon
AssigneeMicron Technology, Inc.
InventorTerry L. Gilton
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Abstract
A process is provided for forming sharp asperities, useful as field emitters. The process comprises: patterning and doping a silicon substrate. The doped silicon substrate is anodized. The anodized area is then used for field emission tips. The process of the present invention is also useful for low temperature sharpening of tips fabricated by other methods. The tips are anodized, and then exposed to radiant energy, and the resulting oxide is removed.
Claims16
A method for fabricating emitter tips using porous silicon, said method comprising the following steps of:
- providing at least one silicon tip;
- anodizing said at least one silicon tip;
- exposing said at least one silicon tip to radiant energy, said radiant energy comprising ultra-violet radiation at room temperature, thereby forming an oxide layer;
- and
- selectively removing said oxide layer from said at least one silicon tip, thereby sharpening said atleast one silicon tip.
A method for sharpening cathode emitters, comprising the steps of:
- providing an array of cathode emitters, said array of cathode emitters being comprised of doped silicon, wherein said doped silicon is P+;
- disposing said array of cathode emitters in an electrochemical bath;
- exposing said array of cathode emitters to radiant energy at low temperature, thereby forming an oxide layer;
- and
- disposing said array of cathode emitters in a solution of hydrofluoric acid to remove said oxide layer.
A method of forming sharp asperities, comprising the steps of:
- patterning a silicon substrate with a masking material;
- doping said silicon substrate with boron;
- anodizing said doped silicon substrate to form said sharp asperities;
- oxidizing said sharp asperities by exposure to radiant energy at low temperature, thereby forming a conformal oxide layer over a surface of said sharp asperities;
- removing said conformal oxide layer;
- and
- removing said masking material.
Dependencies are inferred from the claim text.