Process for forming mask pattern and process for producing thin film magnetic head

A process for producing a thin film magnetic head comprising

• a thin film forming step of forming a thin film constituting said thin film magnetic head on a surface;
• a mask pattern forming step of forming a mask pattern on said thin film formed in said thin film forming step;
• and
• an etching step of shaping the thin film by removing said thin film that is exposed from said mask pattern formed in said mask pattern forming step by etching,
• the mask pattern forming step comprising
• a first coating step of coating a first resist on said thin film;
• a first exposure step of forming a pattern latent image in said first resist by exposing said first resist;
• a second coating step of coating a second resist on said first resist, in which said pattern latent image is formed in said first exposure step;
• a second exposure step of forming a pattern latent image in said second resist by exposing said second resist;
• a first development step of forming an upper layer mask pattern by developing said second resist, in which said latent image is formed in said second exposure step, with a first developer;
• and
• a second development step of forming a lower layer mask pattern by developing said first resist, in which said latent image is formed in said first exposure step, with a second developer,
• the upper layer mask pattern having a resist bridge part in a resist remaining part, in which said second resist remains, said bridge part bridging over a part of said lower mask pattern, in which said first resist is removed, and space being present between said resist bridge part and said surface, on which said mask pattern is formed.