US 6,187,500 B1 · Positive photoresist compositions and multilayer resist materials using same

Abstract

In a positive photoresist composition including (A) an alkali-soluble novolak resin and (B) a naphthoquinonediazide ester, the alkali-soluble novolak resin is obtained synthetically by condensation of phenol compounds and an aldehyde or ketone, and the phenol compounds include, for example, 1% to 20% by mole of hydroquinone, 30% to 95% by mole of m-cresol and 2% to 50% by mole of 2,5-xylenol. Thus, a high-definition positive photoresist composition can be obtained, which inhibits the formation of scum, and is satisfactory in sensitivity, sectional shape, focal depth range and other properties even in a process for the formation of an ultrafine resist pattern of 0.30 μm or below by lithography using i-ray.

Claims11

Dependent claims

A positive photoresist composition comprising:

(A) an alkali-soluble novolak resin, and
(B) a naphthoquinonediazide ester,
said alkali-soluble novolak resin being obtained synthetically by condensation of phenol compounds and an aldehyde or ketone, and said phenol compounds being composed of 1% to 20% by mole of a phenol compound represented by the following formula (I):
wherein R1 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, 30% to 95% by mole of m-cresol, and 2% to 50% by mole of 2,5-xylenol.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

09/432,417Filed 2 Nov 1999

Priority

JP 10-3274662 Nov 1998

Granted

13 Feb 2001

Term ends

Not estimatedThe source records don’t support an estimate.

Classification8 codes

G03F 7/0236
Characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides: condensation products of…
C08G 8/20
Of formaldehyde, e.g. of formaldehyde formed in situ: with polyhydric phenols
C08G 8/28
Condensation polymers of aldehydes or ketones with phenols only: chemically modified polycondensates
C08L 61/12
Of aldehydes with phenols: with polyhydric phenols

Positive photoresist compositions and multilayer resist materials using same

Life of this patent

Positive photoresist compositions and multilayer resist materials using same

Life of this patent

Abstract

Claims11