Gas manifold for uniform gas distribution and photochemistry
AssigneeApplied Materials, Inc.
InventorPeter A. Knoot
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorPeter A. Knoot
Estimating the term…
The invention provides a system for providing a flow of a short-lived, reactive process gas species into an RTP chamber without creating ionic species. An RTP chamber includes a transparent quartz window assembly. The window assembly has a first pane facing a wafer inside the RTP chamber. A second pane is positioned adjacent a heat lamp array on the outside of the RTP chamber. A window side wall joins the first and second panes at their peripheral edges to provide an internal chamber therebetween. A plurality of channels extend through the first pane from the internal chamber to the inside of the RTP chamber. A port communicates between the internal chamber and a process gas source. The window assembly also includes a reflective surface facing the internal chamber. An ultraviolet light source is positioned to illuminate process gas flowing through the window assembly with ultraviolet light such that the ultraviolet light alters the chemistry of the process gas. A process using the reactive gas species can be turned on and off quickly by turning on and off the ultraviolet light.
An apparatus for producing a reactive process gas in a processing chamber, comprising:
A rapid thermal processing chamber for processing a semiconductor wafer positioned within the processing chamber, comprising:
An apparatus for producing a reactive process gas in a processing chamber, comprising:
Dependencies are inferred from the claim text.