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US 6,186,090 B1Granted
Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
AssigneeEnergy Conversion Devices, Inc.
InventorsBuddy R. Dotter, II, Joachim Doehler, Timothy Ellison, Masatsugo Izu, Herbert C. Ovshinsky
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Abstract
Apparatus and method for the vacuum deposition of at least two different layers of thin film material onto a substrate by two different vacuum deposition processes. Also disclosed is a novel linear applicator for using microwave enhanced CVD to uniformly deposit a thin film of material over an elongated substrate.
Claims14
A device for the deposition of thin film material upon a substrate comprising:
- a deposition chamber;
- a vacuum source for evacuating the deposition chamber;
- first means for depositing a layer of thin film material onto the substrate, said first means having a first deposition region disposed within the chamber, said first means adapted for PVD;
- second means for depositing a layer of thin film material onto the substrate, the second means having a second deposition region disposed within the chamber, said second means adapted for CVD, wherein the first deposition region and the second deposition region operate at a pressure within an order of magnitude of each other;
- and
- means for passing the substrate between the first deposition region and the second deposition region.
3 more elements
A device for the deposition of thin film material upon a substrate comprising:
- a chamber;
- means for evacuating the chamber to provide a background pressure;
- first means for depositing a layer of thin film material onto the substrate, said first means having a first deposition region disposed within the chamber, said first means being adapted for CVD;
- second means for depositing a layer of thin film material onto the substrate, the second means having a second deposition region disposed within the chamber, said second means being adapted for PVD, wherein the first deposition region and the second deposition region operate at pressures greater than the background pressure;
- and
- means for passing the substrate between the first deposition region and the second deposition region.
3 more elements
Dependencies are inferred from the claim text.