Holographic patterning method and tool employing prism coupling

A method of performing holographic lithography for generating an interference pattern suitable for selectively exposing a photosensitive material, the method comprising the steps of:

• (a) generating a plurality of divergent illuminating beams that are directed through an ambient environment having a known index of refraction by transmitting the illuminating beams from transmissive ends of a plurality of optical fibers and adjustably mounting the transmissive ends of the optical fibers on a support structure such that positions and angles of the illuminating beams relative to the photosensitive material can be adjusted by moving the transmissive ends of the optical fibers to different points on the support structure;
• (b) passing the illuminating beams through a medium having a higher index of refraction than the known index of refraction, the illuminating beams refracted by the medium overlapping to form an optical interference pattern;
• and
• (c) exposing the photosensitive material with the light interference pattern formed by the refracted illuminating beams.

A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material, comprising:

• a platform for mounting a workpiece having a photosensitive surface;
• a beam delivery system configured to direct three illuminating beams toward said platform in an overlapping manner to form an optical interference pattern in the vicinity of the workpiece;
• and
• a prism in optical contact with the photosensitive surface and having three faces corresponding to the three illuminating beams, said prism refracting the illuminating beams incident on said prism and transmitting the refracted illuminating beams toward the workpiece, such that the photosensitive surface of the workpiece is selectively exposed by the illuminating beams refracted by said prism.

A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material, comprising:

• a platform for mounting a workpiece having a photosensitive surface;
• a beam delivery system configured to direct a plurality of illuminating beams toward said platform in an overlapping manner to form an optical interference pattern in the vicinity of the workpiece;
• and
• a prism in optical contact with the photosensitive surface and having a base facing said platform and inclined curved faces corresponding to the illuminating beams, said prism refracting the illuminating beams incident on said prism and transmitting the refracted illuminating beams toward the workpiece, such that the photosensitive surface of the workpiece is selectively exposed by the illuminating beams refracted by said prism.

A method of performing holographic lithography for generating an interference pattern suitable for selectively exposing a photosensitive material, the method comprising the steps of:

• (a) generating three divergent illuminating beams that are directed through an ambient environment having a known index of refraction;
• (b) passing the illuminating beams through a medium having a higher index of refraction than the known index of refraction, the illuminating beams refracted by the medium overlapping to form an optical interference pattern;
• and
• (c) exposing the photosensitive material with the light interference pattern formed by the refracted illuminating beams.

A method of performing holographic lithography for generating an interference pattern suitable for selectively exposing a photosensitive material, the method comprising the steps of:

• (a) generating a plurality of divergent illuminating beams that are directed through an ambient environment having a known index of refraction;
• (b) passing the illuminating beams through a medium having curved faces and a higher index of refraction than the known index of refraction, the illuminating beams refracted by the medium overlapping to form an optical interference pattern;
• and
• (c) exposing the photosensitive material with the light interference pattern formed by the refracted illuminating beams.