Electron apparatus using electron-emitting device and image forming apparatus

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate, a third region with a length d3 from a portion connected to said front substrate, the third region being extended along an edge connected to the front substrate and a second region sandwiched between the first and third regions, potential differences per unit length in a longitudinal direction on the surface of said support member in the first and third regions are smaller than a potential difference per unit length in the longitudinal direction on the surface of said support member in the second region, and letting ΔV1 be a potential difference between a potential of a portion connected to said rear substrate and a potential of an end portion of the first region on the second region side, and ΔV3 be a potential different between a potential of a portion connected to said front substrate and a potential of an end portion of the third region on the second region side, the potential differences satisfy:
• ΔV1/d1>ΔV3/d3.

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate and a resistance R1 per unit length in a longitudinal direction, a third region with a length d3 from a portion connected to said front substrate and a resistance R3 per unit length in the longitudinal direction, and a second region which is sandwiched between the first and third regions and has a resistance R2 per unit length in the longitudinal direction, both R1 and R3 are lower than R2, and the third region is electrically connected to an accelerating electrode provided on said front substrate, and the length of the first and third regions satisfy the following condition:
• d1<d3.

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate and a resistance R1 per unit length in a longitudinal direction, a third region with a length d3 from a portion connected to said front substrate and a resistance R3 per unit length in the longitudinal direction, and a second region which is sandwiched between the first and third regions and has a resistance R2 per unit length in the longitudinal direction, both R1 and R3 are lower than R2, and the third region is electrically connected to an accelerating electrode provided on said front substrate, and the resistances of the first and third regions satisfy the following condition:
• R1>R3.

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate and a resistance R1 per unit length in a longitudinal direction, a third region with a length d3 from a portion connected to said front substrate and a resistance R3 per unit length in the longitudinal direction, and a second region which is sandwiched between the first and third regions and has a resistance R2 per unit length in the longitudinal direction, both R1 and R3 are lower than R2, and the third region is provided in an electrified area of said support member, and the length of the first and third regions satisfy the following condition:
• d1<d3.

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate and a resistance R1 per unit length in a longitudinal direction, a third region with a length d3 from a portion connected to said front substrate and a resistance R3 per unit length in the longitudinal direction, and a second region which is sandwiched between the first and third regions and has a resistance R2 per unit length in the longitudinal direction, both R1 and R3 are lower than R2, and the third region is provided in an electrified area of said support member, and the resistances of the first and third regions satisfy the following condition:
• R1>R3.

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate and a resistance R1 per unit length in a longitudinal direction, a third region with a length d3 from a portion connected to said front substrate and a resistance R3 per unit length in the longitudinal direction, and a second region which is sandwiched between the first and third regions and has a resistance R2 per unit length in the longitudinal direction, both R1 and R3 are lower than R2, and the third region is provided on both sides of said support member, and the length of the first and third regions satisfy the following condition:
• d1<d3.

An electron apparatus comprising:

• a rear substrate having an electron-emitting device;
• a front substrate having a member to be irradiated with electrons;
• and
• a support member for maintaining an interval between said rear substrate and said front substrate,
• wherein an electric field for accelerating electrons from said rear substrate toward said front substrate is applied, a surface of said support member has a first region with a length d1 from a portion connected to said rear substrate and a resistance R1 per unit length in a longitudinal direction, a third region with a length d3 from a portion connected to said front substrate and a resistance R3 per unit length in the longitudinal direction, and a second region which is sandwiched between the first and third regions and has a resistance R2 per unit length in the longitudinal direction, both R1 and R3 are lower than R2, and the third region is provided on both sides of said support member, and the resistances of the first and third regions satisfy the following condition:
• R1>R3.