Ion source
AssigneeEbara Corporation
InventorsVadim G. Dudnikov, Mehran Nasser-Ghodsi
Life of this patent
Estimating the term…
Abstract
An ion source is provided that is constructed for use with a magnet that produces magnetic flux lines extending in a predetermined direction and a source of ionizable material for creating ion. The ion source includes a chamber, defined by walls, and a relatively narrow outlet aperture for ions produced in the chamber to leave the chamber. The chamber encloses a cathode and an anode spaced from the cathode and from the walls of the chamber. The anode is positioned with respect to the aperture, the cathode and the predetermined direction of the magnetic flux to cause ions produced in the chamber to drift in crossed magnetic and electric fields so as to concentrate near the aperture.
Claims22
An ion source constructed for use with a magnet that produces magnetic flux lines extending in a predetermined direction and a source of ionizable material for creating ions, the ion source comprising:
- a chamber, said chamber being defined by walls,
- a relatively narrow outlet aperture for ions produced in the chamber to leave the chamber, the chamber enclosing
- a cathode,
- an anode spaced from the cathode and from the walls of the chamber, and
- the anode being positioned with respect to the aperture, the cathode and the predetermined direction of the magnetic flux to cause ions produced in the chamber to concentrate near the aperture,
- wherein said walls, which are separate from said cathode, have substantially the same voltage as said cathode.
An ion source constructed for use with a magnet that produces magnetic flux lines extending in a predetermined direction, the ion source comprising:
- a chamber, said chamber being defined by walls,
- a relatively narrow, elongated outlet slit for ions produced in the chamber to leave the chamber, the chamber enclosing
- a cathode,
- an anode spaced from the cathode and from the walls of the chamber, the anode being elongated and positioned adjacent to and generally parallel to the slit,
- the ion source and magnet being relatively positioned such that the magnetic flux lines are generally parallel to the anode and at an angle to an electrical field produced between the anode and the cathode,
- wherein said walls, which are separate from said cathode, have substantially the same voltage as said cathode.
An ion implanter for implanting ions in a work piece comprising:
- an ion source,
- a plurality of magnets to focus and scan the ion beam in a first direction,
- a workpiece holder to hold the workpiece and to move perpendicular to the first direction,
- wherein the ion source is constructed for use with a magnet that produces magnetic flux lines extending in a predetermined direction, the ion source comprising:
- a chamber, said chamber being defined by walls,
- a relatively narrow, elongated outlet slit for ions produced in the chamber to leave the chamber, the chamber enclosing
- a cathode,
- an anode spaced from the cathode and from the walls of the chamber, the anode being elongated and positioned adjacent to and generally parallel to the outlet slit,
- the ion source and magnet being relatively positioned such that the magnetic flux lines are generally parallel to the anode and at an angle to an electrical field produced between the anode and the cathode,
- wherein said walls, which are separate from said cathode, have substantially the same voltage as said cathode.
Dependencies are inferred from the claim text.