Photolithographically patterned spring contact
AssigneeXerox Corporation
InventorsDonald Leonard Smith, Andrew Sebastian Alimonda
Life of this patent
Estimating the term…
Abstract
A photolithographically patterned spring contact is formed on a substrate and electrically connects contact pads on two devices. The spring contact also compensates for thermal and mechanical variations and other environmental factors. An inherent stress gradient in the spring contact causes a free portion of the spring contact to bend up and away from the substrate. An anchor portion remains fixed to the substrate and is electrically connected to a first contact pad on the substrate. The spring contact is made of an elastic material and the free portion compliantly contacts a second contact pad, thereby electrically interconnecting the two contact pads.
Claims79
A method for forming a contact, comprising the steps of:
- fixing a first layer of an elastic material to a substrate so that the first layer is attached to the substrate;
- fixing at least one additional layer of the elastic material to the first layer so the at least one additional layer has a different level of inherent stress than the first layer and so the first layer and at least one additional layer form an elastic member composed of a single elastic material;
- and
- releasing a portion of the first layer from the substrate;
- wherein the released portion of the first layer is forced by an inherent stress gradient in the layers to move away from the substrate.
A method of forming a contact, comprising the steps of:
- fixing an elastic member consisting of a single elastic material having an inherent stress gradient to a substrate so that the elastic material is attached to the substrate;
- and
- releasing a portion of the elastic material from the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate.
A method of forming a probe card, comprising:
- providing a substrate;
- fixing an elastic member consisting of a single elastic material to the substrate so that an inherent stress gradient is formed in the elastic material;
- releasing a portion of the elastic material so that the inherent stress gradient forces a portion of the elastic member away from the substrate;
- and
- forming electronic circuitry on the substrate that communicates with the elastic material.
A method of forming a contact, comprising the steps of:
- providing a substrate consisting of one of silicon, silicon dioxide and silicon nitride;
- fixing a single elastic material having an inherent stress gradient to the substrate so that the elastic material is attached to the substrate;
- and
- releasing a portion of the elastic material from the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate.
The method of claim further comprising:
- forming electronic circuitry on the substrate that communicates with the elastic material.
A method of forming a contact, comprising the steps of:
- fixing an elastic material having an inherent stress gradient to a substrate so that the elastic material is attached to the substrate;
- releasing a portion of the elastic material from the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate;
- and
- annealing at least a part of the elastic material.
A method of forming a contact, comprising the steps of:
- fixing an elastic material having an inherent stress gradient to a substrate so that the elastic material is attached to the substrate;
- and
- releasing a portion of the elastic material from the substrate by heating a portion of the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate.
A method of forming a contact, comprising the steps of:
- fixing an elastic material having an inherent stress gradient to a substrate so that the elastic material is attached to the substrate;
- etching windows in the elastic material;
- and
- releasing a portion of the elastic material from the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate.
A method of forming a contact, comprising the steps of:
- fixing an elastic material having an inherent stress gradient to a substrate so that the elastic material is attached to the substrate;
- releasing a portion of the elastic material from the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate;
- and
- ultrasonically scrubbing a tip of the released portion into a contact pad.
A method of forming a contact, comprising the steps of:
- fixing a single elastic material having an inherent stress gradient to a substrate so that the elastic material is attached to the substrate;
- releasing a portion of the elastic material from the substrate so that the inherent stress gradient forces the portion of the elastic material to bend away from the substrate;
- and
- packaging the elastic material inside of a hermetically-sealed cover.
Dependencies are inferred from the claim text.