US 6,184,041 B2 · Fused hybrid resist shapes as a means of modulating hybrid resist space width

Abstract

The preferred embodiment of the present invention overcomes the limitations of the prior art and provides a method to form spaces in hybrid resist with varying widths. In particular, the preferred method facilitates the formation of spaces with different widths by using mask shapes (either openings or lines) that are smaller than the diffraction limit of the photolithography tool. Diffraction effects at these dimensions reduce the light intensity reaching the resist surface such that the hybrid resist receives an intermediate exposure. These portions of hybrid resist that receive an intermediate exposure are soluble in developer and thus develop away to form spaces in the hybrid resist. Thus, spaces in the hybrid resist of varying widths can be formed.

Claims21

Dependent claims

A method for forming features on a substrate, the method comprising the steps of:

a) depositing a layer of hybrid resist on said substrate;
b) exposing said hybrid resist layer in an exposure system through a mask containing at least one sub-critical dimension mask shape such that a first portion of said hybrid resist corresponding to said at least one sub-critical dimension shape is exposed to an intermediate exposure level;
c) developing said hybrid resist layer such that said first portion of said hybrid resist is removed.

Dependencies are inferred from the claim text.

Facts

Application

09/078,118Filed 13 May 1998

Granted

6 Feb 2001

Term ends

Not estimatedThe source records don’t support an estimate.

Classification5 codes

G03F 7/039
Photosensitive materials: macromolecular compounds which are photodegradable, e.g. positive electron resists
G03F 7/038
Photosensitive materials: macromolecular compounds which are rendered insoluble or differentially wettable
G03F 7/095
Characterised by structural details, e.g. supports, auxiliary layers: having more than one photosensitive layer
G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Fused hybrid resist shapes as a means of modulating hybrid resist space width

Life of this patent

Fused hybrid resist shapes as a means of modulating hybrid resist space width

Life of this patent

Abstract

Claims21