Brazing or soldering material and manufacturing method therefor
AssigneeSeiko Epson Corporation
InventorsYoshiaki Mori, Katsuhiro Takahashi, Takuya Miyakawa, Yasushi Karasawa
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AssigneeSeiko Epson Corporation
InventorsYoshiaki Mori, Katsuhiro Takahashi, Takuya Miyakawa, Yasushi Karasawa
Estimating the term…
Brazing or soldering materials which effectively improve the wettability of the brazing alloy or solder without using flux and a method of manufacturing such materials are provided. A metallic base is placed on turntable inside a vacuum chamber. A copper target is affixed to a sputtering electrode above the metallic base. Air is removed from the vacuum chamber through a vacuum outlet to increase the vacuum therein to a specific pressure, and carbon tetrafluoride and argon are introduced from a gas inlet to control the sputter pressure. Thereafter, turntable is rotated while a high frequency voltage is applied between the target and the metallic base to form a halide layer, such as a layer of copper fluoride, on a surface of metallic base.
A soldering and brazing material, comprising:
A material used in one of soldering and brazing, comprising:
A method of manufacturing a soldering and brazing material, comprising a step of:
A method of manufacturing a material used in one of soldering and brazing, comprising the steps of:
A method of manufacturing a material used in one of soldering and brazing, comprising a step of:
A method of manufacturing a material used in one of soldering and brazing, comprising a step of:
A joined assembly, comprising:
A method of joining a first metal to a second metal to form a joined assembly, comprising the steps of:
Dependencies are inferred from the claim text.