Coating film forming method and coating apparatus
AssigneeTokyo Electron Limited
InventorYoshiharu Ota
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Abstract
Disclosed is a method of forming a coating film, in which a coating solution is supplied from a linear nozzle onto a substrate held by a spin chuck arranged inside a cup having an opening so as to form a coating film on the substrate, comprising the steps of (a) allowing a spin chuck to hold rotatably a substrate, and (b) moving the linear nozzle and supplying a coating solution from the linear nozzle onto the substrate while rotating the substrate in a moving direction of the linear nozzle.
Claims17
A method of forming a coating film, in which a coating solution is supplied from a linear nozzle supported by a horizontal arm onto a rectangular substrate held by a spin chuck arranged inside a cup having an opening so as to form a coating film on the rectangular substrate, comprising the steps of:
- (a) allowing the spin chuck to hold rotatably the rectangular substrate and aligning the linear nozzle and the substrate relative to each other such that the linear nozzle is disposed in parallel with a short side or long side of the rectangular substrate;
- and
- (b) supplying a coating solution from the linear nozzle onto the substrate while rocking the linear nozzle in substantially a same direction as a rotating direction of the rectangular substrate while rotating the rectangular substrate, and shaking the linear nozzle in substantially an opposite direction to the rotating direction of the rectangular substrate, so that the coating solution is substantially uniformly spread over an entire upper surface of the rectangular substrate.
A coating apparatus comprising:
- a spin chuck for rotatably holding a rectangular substrate;
- a linear nozzle for supplying a coating solution onto the rectangular substrate;
- a switching mechanism for switching supply and stop of supply of the coating solution from the linear nozzle;
- a rotation drive mechanism for rotating the spin chuck;
- a horizontal arm for supporting the linear nozzle movably above the rectangular substrate held by the spin chuck;
- a rocking mechanism for supporting the horizontal arm and rocking the horizontal arm substantially within a horizontal surface;
- a shaking mechanism mounted on the horizontal arm, for shaking the linear nozzle substantially within the horizontal plane;
- and
- a control mechanism for controlling each of the switching mechanism, the rotation drive mechanism, the rocking mechanism and the shaking mechanism, so that a coating solution is substantially uniformly spread over an entire upper surface of the rectangular substrate when the coating solution is supplied from the linear nozzle onto the rectangular substrate while rocking the linear nozzle in substantially a same direction as a rotating direction of the rectangular substrate while rotating the rectangular substrate, and shaking the linear nozzle in substantially an opposite direction to the rotating direction of the rectangular substrate.
Dependencies are inferred from the claim text.