Process solution supply system, substrate processing apparatus employing the system, and intermediate storage mechanism employed in the system

A process solution supply system for supplying a process solution to a processing unit for processing a substrate, selected from the group consisting of a semiconductor wafer and an LCD substrate, the system comprising:

• a process solution supply source from which the process solution is supplied;
• an intermediate storage mechanism for temporarily storing the process solution supplied from the process solution supply source and for supplying the process solution with predetermined pressure applied thereto, wherein said intermediate storage mechanism includes
• a vessel which has an introduction port and a discharge port for the process solution, and is configured to store the process solution supplied through the introduction port and discharge the process solution to the processing unit, and
• a compressing member which is arranged inside the vessel to be located between the process solution and a fluid, and is configured to permit pressure of the fluid to act on the process solution;
• a fluid supply mechanism for supplying the intermediate storage mechanism with the fluid which serves to actuate the intermediate storage mechanism;
• and
• a gas-removing mechanism for removing gas bubbles contained in the process solution, wherein said gas-removing mechanism includes
• a gas exhaust port, provided for the vessel, for allowing bubbles contained in the process solution to be discharged from the vessel, and
• a pressure-lowering mechanism arranged at the introduction port of the vessel and configured to lower pressure of the process solution introduced through the introduction port, thereby causing gas dissolved in the process solution to bubble.

A substrate processing system comprising:

• a processing unit for processing a substrate, selected from the group consisting of a semiconductor wafer and an LCD substrate, using a process solution;
• a process solution supply source from which the process solution is supplied;
• a plurality of intermediate storage mechanisms each for temporarily storing the process solution supplied from the process solution supply source and for supplying the process solution with predetermined pressure applied thereto, wherein each of said intermediate storage mechanisms includes
• a vessel which has an introduction port and a discharge port for the process solution, and is configured to store the process solution supplied through the introduction port and discharge the process solution to the processing unit, and
• a compressing member which is arranged inside the vessel to be located between the process solution and a fluid, and is configured to permit pressure of the fluid to act on the process solution;
• a fluid supply mechanism for supplying each of the intermediate storage mechanisms with the fluid which serves to actuate the intermediate storage mechanisms;
• switching valves for selectively switching flows of the process solution, which is supplied from the process solution supply source to the processing unit through the intermediate storage mechanisms;
• and
• a switching valve control device configured to control the switching valves to switch flows of the process solution such that the process solution is continuously supplied to the processing unit.

A process solution supplying method of supplying a process solution to a processing unit for processing a substrate, selected from the group consisting of a semiconductor wafer and an LCD substrate, wherein said process solution supplied from a process solution supply source is first stored in a plurality of intermediate storage mechanisms and then supplied to the processing unit, the method comprising:

• supplying the process solution from a given one of the intermediate storage mechanisms;
• refilling another one of the intermediate storage mechanisms with the process solution supplied from the process solution supply source, when the process solution is being supplied from the given intermediate storage mechanism;
• and
• starting supply of the process solution from said another one of the intermediate storage mechanisms upon detection of end of the supply of the process solution from the given intermediate storage mechanism, such that the process solution is continuously supplied to the processing unit.