Hollow cathode for plasma doping system
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsMatthew J. Goeckner, Ziwei Fang
Life of this patent
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Abstract
A plasma doping apparatus includes a hollow cathode to increase throughput and uniformity of ion implantations in a target. The hollow cathode is located adjacent an anode and a target cathode on which a target is placed. An ionizable gas is provided in a space between the anode and the target cathode. The space in which the ionizable gas is provided is surrounded by the hollow cathode. The hollow cathode has either a circular or rectangular cross-section.
Claims12
A pulsed plasma processing system, comprising:
- an anode;
- a target cathode on which a first target is to be placed, the target cathode spaced apart from the anode;
- and
- a hollow cathode disposed adjacent to each of the anode and the target cathode,
- wherein the hollow cathode surrounds a portion of a space between the anode and the target cathode, and
- wherein the entire hollow cathode is at one potential.
A pulsed plasma processing system, comprising:
- an enclosure;
- an anode provided within the enclosure, the anode and enclosure coupled to a reference voltage;
- a target cathode on which a first target is to be placed, the target cathode provided within the enclosure, spaced apart from the anode;
- a hollow cathode disposed within the enclosure and adjacent to each of the anode and the target cathode, the hollow cathode to surround a portion of a space between the anode and the target cathode;
- and
- a high voltage pulse source connected to the target cathode and the hollow cathode,
- wherein the entire hollow cathode is at one potential.
A pulsed plasma processing system, comprising:
- a first anode;
- a second anode spaced apart from and opposite to the first anode;
- a hollow cathode disposed adjacent to the first and second anodes, the hollow cathode to surround a space between the first and second anodes;
- and
- a first high voltage pulse source to supply a positive voltage pulse, relative to a reference voltage, to each of the first and second anodes;
- wherein the hollow cathode is coupled to the reference voltage.
Dependencies are inferred from the claim text.