Waste water classifying recovery apparatus in wafer cleaning system

Abstract

In a single wafer cleaning system of a single tank type in which wafers are one by one sprayed with chemical liquid and rinse water used in a successive order, not only can waste water is recovered while being classified into chemical liquid waste water and rinse waste water, but also the rinse waste water is recovered while being classified into cloudy rinse waste water and clean rinse waste water. A waste water classifying recovery apparatus comprises: chemical liquid waste water lines 15, 16 and a rinse waste water line 17 connected to a treatment tank 1; chemical liquid/rinse selective distributor automatic valves 10, 11, 12 respectively provided on the lines; a concentration meter sensor 18 for detecting a concentration of the rinse waste water on the rinse waste water line 17 downstream from the distributor automatic valve 12; a cloudy rinse waste water line 17a and a clean rinse waste water line 17b branched from the rinse waste water line 17 downstream from the concentration meter sensor 18; and cloudy/clean rinse distributor valves 13, 14 respectively provided on the waste water lines 17a, 17b; wherein the distributor automatic valve 13 on the cloudy rinse waste water line 17a or the distributor automatic valve 14 on the clean rinse waste water line 17b is opened according to a detection signal of the concentration meter sensor 18, so that the cloudy rinse waste water or the clean rinse waste water is separately drained.

Dependencies are inferred from the claim text.