Fracture-resistant micromachined devices

A method for forming a micromachined device comprising the steps of:

• providing a composite silicon bulk substrate, said substrate including a first section and a second section of single-crystal silicon joined together such the crystal plane structure of said first section is misaligned with the crystal plane structure of said second section;
• and
• etching said composite substrate to form said device.

A method for forming a micromachined device for performing a specified function comprising the steps of:

• providing a first section of single crystal silicon having a first set of elements thereon;
• providing a second section of single crystal silicon having a second set of elements thereon;
• and joining said first and said second sections together such that said crystal planes of said first section and said second section are misaligned and such that said first set and said second set of elements are aligned so as to cooperate to perform said specified function.

A method for forming a micromachined device comprising the steps of:

• providing a composite silicon bulk material substrate, said substrate including a first section of polysilicon and a second section of single-crystal silicon joined together;
• and
• etching said composite substrate to form said device.

A composite silicon bulk material substrate for micromachined devices, the substrate comprising a first section of single-crystal silicon and a second section of single-crystal silicon joined together such the crystal plane structure of said first section is misaligned with the crystal plane structure of said second section.

A micromachined device for performing a specified function, the device including a first section of single crystal silicon and a second section of single crystal silicon joined together such that the crystal plane structure of said first section is misaligned with the crystal plane structure of said second section.

An atomizer comprising:

• first layer substrate having a spin chamber shaped to guide liquid in a vortex motion toward a center of said spin chamber, an annulus generally encircling said spin chamber, at least one channel connecting said annulus to said spin chamber, and an orifice in said spin chamber;
• and
• a second layer substrate joined to said first layer substrate, said second layer substrate having a trough shaped to deliver liquid to said annulus, wherein one of said first layer or said second layer is polycrystalline silicon, and wherein the other of said first layer or said second layer is single crystal silicon.

A composite silicon bulk material for use as a substrate for forming micromachined devices, the material comprising a first section of polysilicon and a second section of single-crystal silicon.