US 6,170,429 B2 · Chamber liner for semiconductor process chambers

Abstract

A chamber liner for use in a semiconductor process chamber and a semiconductor process chamber containing the chamber liner are disclosed. The process chamber includes a housing having an inner surface defining a chamber in which a vacuum is drawn during processing of a semiconductor wafer. The chamber liner has a plasma confinement shield with a plurality of apertures. An outer sidewall extends upwardly from the plasma confinement shield. An outer flange extends outwardly from the outer sidewall such that the outer flange extends beyond the chamber and into a space at atmospheric pressure. The chamber liner preferably further includes an inner sidewall that extends upwardly from the plasma confinement shield. The plasma confinement shield, the inner and outer sidewalls, and the outer flange are preferably integral with one another.

Claims15

Dependent claims

A chamber liner for use in a process chamber used in semiconductor fabrication, comprising:

a plasma confinement shield having a plurality of apertures, said plasma confinement shield having an annular configuration defining an inner circumference and an outer circumference, a cylindrical outer sidewall extending upwardly from said outer circumference of said plasma confinement shield for a first distance, a cylindrical inner sidewall extending upwardly from said inner circumference of said plasma confinement shield for a second distance, the first distance being longer than the second distance, and an outer flange extending outwardly from said outer sidewall, said outer flange being configured to extend beyond an internal vacuum region of a process chamber and into a space at atmospheric pressure.

Dependencies are inferred from the claim text.

Chamber liner for semiconductor process chambers

Life of this patent

Chamber liner for semiconductor process chambers

Life of this patent

Abstract

Claims15