Method of patterning a metal layer
OwnerPeter Braden Calveleyinventor
Life of this patent
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Abstract
A metal layer is patterned by compression moulding using a stamp to create a thickness contrast pattern, followed by etching to transfer the thickness contrast pattern into the entire thickness of the metal layer. The stamp is typically patterned using a technique such as electron beam lithography, and the etchant typically etches through the entire metal layer. The method is used to produce structures such as microelectronic circuits.
Claims20
A method of patterning a substantially crystalline solid layer having a substantially crystalline solid surface, comprising the steps of:
- (a) providing a stamp having a stamping surface defining a first pattern;
- (b) positioning at least one of said stamping surface and said substantially crystalline solid surface in a first orientation wherein at least a portion of said stamping surface contacts at least a portion of said substantially crystalline solid surface, thereby to compression mould a moulded substantially crystalline solid surface defining a thickness contrast pattern in said substantially crystalline solid layer and;
- (c) effecting relative movement between said stamping surface and said substantially crystalline solid surface wherein said portion of said stamping surface contacting said portion of said substantially crystalline solid surface, is removed from said portion of said substantially crystalline solid surface, to provide a moulded substantially crystalline solid surface defining a thickness contrast pattern in said substantially crystalline solid layer;
- and
- (d) etching through said substantially crystalline solid layer at said moulded substantially crystalline solid surface to remove material from said substantially crystalline solid layer and thereby transfer said thickness contrast pattern into the entire thickness of said substantially crystalline solid layer.
A method of patterning a metal layer having a metal surface, comprising the steps of:
- (a) providing a stamp having a stamping surface defining a first pattern;
- (b) positioning at least one of said stamping surface and said metal surface in a first orientation wherein at least a portion of said stamping surface contacts at least a portion of said metal surface, thereby to compression mould a moulded metal surface defining a thickness contrast pattern in said metal layer and;
- (c) effecting relative movement between said stamping surface and said metal surface wherein said portion of said stamping surface contacting said portion of said metal surface, is removed from said portion of said metal surface, to provide a moulded metal surface defining a thickness contrast pattern in said metal layer;
- and
- (d) etching through said metal layer at said moulded metal surface to remove material from said metal layer and thereby transfer said thickness contrast pattern into the entire thickness of said metal layer.
Dependencies are inferred from the claim text.