Platinum source compositions for chemical vapor deposition of platinum

A process for forming a platinum coating on a substrate in a chemical vapor deposition reactor, comprising the steps of:

• (a) providing a platinum source reagent liquid solution, comprising:
• (i) at least one platinum source compound selected from the group consisting of compounds of the formulae:
• (A) RCpPt(IV)R'.sub.3 compounds, of the formula:
• ##STR11## wherein:
• R is selected from the group consisting of hydrogen, methyl, ethyl, i-propyl, n-propyl, n-butyl, i-butyl, t-butyl, trimethylsilyl and trimethylsilyl methyl;
• and each R' is independently selected from the group consisting of methyl, ethyl, i-propyl, n-propyl n-butyl, i-butyl, t-butyl, trimethylsilyl and trimethylsilyl methyl;
• and
• (B) Pt(.beta.-diketonates).sub.2 of the formula:
• ##STR12## wherein:
• each R" is independently selected from the group consisting of methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, trifluoromethyl, perfluoroethyl and perfluoro-n-propyl, and
• (ii) a solvent medium therefor;
• (b) volatilizing the platinum source reagent liquid solution to form a platinum source reagent vapor therefrom:
• (c) transporting the platinum source reagent vapor to a chemical vapor deposition reactor;
• and
• (d) depositing platinum from the platinum source reagent vapor on the substrate in the chemical vapor deposition reactor under chemical vapor deposition conditions effective therefor;
• wherein said chemical vapor deposition conditions comprise the presence of a reducing gas comprising ammonia.