Method of cleaning quartz substrates using conductive solutions

Abstract

A cleaning method for a quartz substrate includes mixing a rinsing solution and mixing a cleaning solution such that the solutions are electrically conductive. The rinsing solution is carbonated and is used in more than one step within the method. The cleaning solution includes ammonium hydroxide. As a result of the electrical conductivity of the solutions, the cleaning method is less susceptible to surface damage caused by electrostatic discharge. The sequence of steps includes rinsing the quartz substrate with the carbonated rinsing solution, removing loose contaminants by a high pressure application of the cleaning solution, and removing organic contaminants in a strong oxidation environment using a solution of sulfuric acid and hydrogen peroxide. The carbonated rinsing solution is again applied, followed by another high pressure application of the cleaning solution and a final rinse with the carbonated rinsing solution. In the preferred embodiment, the cleaned quartz substrate is used to form a laser ablation mask by depositing dielectric layers that are patterned to define an exposure pattern. In the most preferred embodiment, the laser ablation mask is used in the fabrication of inkjet printheads.

Dependencies are inferred from the claim text.