Semiconductor wafer grinding apparatus
AssigneeDisco Corporation
InventorsYutaka Koma, Motomi Kitano, Takashi Kouda
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AssigneeDisco Corporation
InventorsYutaka Koma, Motomi Kitano, Takashi Kouda
Estimating the term…
Disclosed is an improved semiconductor wafer grinding apparatus comprising at least wafer holding means and wafer grinding means. The wafer holding means comprises a holder having a wafer-gripping surface for sucking and holding a selected semiconductor wafer and liquid bearing means for rotatably supporting the holder. The liquid bearing means has inclination control means formed therein, and the inclination control means includes discrete inclination controlling areas for suspending the holder at upper and lower levels. Each inclination controlling area has flow rate control means connected thereto. The parallelism of the wafer-gripping surface relative to the wafer grinding means is assured by controlling the flow rate of the liquid to each inclination controlling area.
An apparatus for grinding semiconductor wafers comprising at least means for holding semiconductor wafers and means for grinding semiconductor wafers, wherein said means for holding semiconductor wafers comprises holder means having wafer-gripping surface for sucking and holding semiconductor wafers and liquid bearing means for rotatably supporting said holder means, said liquid bearing means having inclination control means formed therein, said inclination control means including first, second and third sets of inclination controlling areas for suspending said holder means, each having first and second pockets formed at upper and lower levels, said first set of inclination controlling area having a first flow rate control means connected thereto, said second set of inclination controlling area having a second flow rate control means connected thereto, and said third set of inclination controlling area having a third flow rate control means, whereby the parallelism of said wafer-gripping surface relative to said means for grinding semiconductor wafers is assured by controlling the flow rate of the liquid to each of said first, second and third sets of inclination controlling areas.
Dependencies are inferred from the claim text.