Method and apparatus for high precision variable rate material removal and modification
AssigneeY-Beam Technologies, Inc.
InventorJoseph Neev
Life of this patent
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Abstract
A method and apparatus is disclosed for fast precise material processing and modification which minimizes collateral damage. Utilizing optimized, pulsed electromagnetic energy parameters leads to an interaction regime which minimizes residual energy deposition. Advantageously, removal of cumulative pulse train residual energy is further maximized through the rapid progression of the ablation front which move faster than the thermal energy diffusion front, thus ensuring substantial removal of residual energy to further minimize collateral thermal damage.
Claims7
A method for ablating material with directed energy, the method comprising:
- a) determining at least one characteristic of the material to be ablated, determining at least one characteristic of the material to be ablated comprising:
- i) ablating the material with a pulse of the directed energy;
- ii) determining the approximate quantity of the material ablated;
- and
- iii) determining the approximate quantity of the material permanently modified;
- b) defining a pulse of the directed energy which increases a ratio of a quantity of the material which will be ablated thereby with respect to a quantity of the material which will be permanently modified thereby, the characteristic(s) of the material determined in step (a) at least partially defining the pulse;
- and
- c) ablating the material with at least one pulse of directed energy which is defined according to step (b);
- d) wherein ablating the material with directed energy defined according to step (b) minimizes undesirable permanent modification of the material.
A device for ablating material with directed energy, the device comprising:
- a) a sensor for determining at least one characteristic of the material to be ablated;
- b) an energy radiating device for directing a pulse of energy at the material;
- and
- c) a controller for controlling the energy radiating device so as to define a pulse rate of the directed energy which increases a ratio of the quantity of the material which will be ablated thereby with respect to the quantity of the material which will be permanently modified thereby;
- d) wherein ablating the material with a plurality of directed energy pulses having a sufficient pulse rate as to increase the ratio of the quantity of the material which will be ablated thereby with respect to the quantity of the material which will be permanently modified thereby minimizes undesirable permanent modification of the material.
A device for material modification and processing, the device comprising:
- a) an energy radiating device for directing a plurality of pulses of energy at the material, the pulses having a sufficient pulse rate so as to increase a ratio of the quantity of the material which is ablated thereby with respect to quantity of the material which is permanently modified thereby;
- and
- b) a controller for controlling the energy radiating device, the controller configuring the pulse directed therefrom so as to increase a ratio of the quantity of the material which is permanently modified thereby;
- c) a means for modifying said energy radiating device output energy wavelength;
- d) wherein ablating the material with a plurality of directed energy pulses and with output parameters configured to increase the ratio of the quantity of the material which is ablated thereby with respect to the quantity of the material which is permanently modified thereby minimizes undesirable modification of the material.
Dependencies are inferred from the claim text.