Silver halide emulsion and silver halide light-sensitive material using the same
AssigneeFuji Photo Film Co., Ltd.
InventorsYoichi Maruyama, Kimiyasu Morimura, Nobuyuki Haraguchi, Hiroyuki Mifune, Tetsuro Kojima
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Abstract
There is disclosed a light-sensitive silver halide photographic emulsion, which comprises light-sensitive silver halide grains mainly composed of (100) planes and (111) planes, at least one compound that is adsorbed selectively on the (100) planes of the silver halide grains, and at least one spectrally sensitizing dye. There is also disclosed a light-sensitive material using the emulsion. The emulsion is high in sensitivity and excellent in graininess.
Claims13
A light-sensitive silver halide photographic emulsion, comprising light-sensitive silver halide grains mainly composed of (100) planes and (111) planes, at least one compound that is adsorbed selectively on the (100) planes of the silver halide grains, and at least one spectrally sensitizing dye that is adsorbed selectively to (111) planes of the silver halide grains, wherein tabular grains having an aspect ratio in the range of 2 to 100 amount to at least 50% of all the silver halide grains in number, dislocation lines are observed in the tabular grains, and the tabular grains are composed of principal planes and side planes, wherein the side planes comprise (100) planes.
A silver halide photographic light-sensitive material, having at least one light-sensitive silver halide emulsion layer on a support, wherein at least one of emulsion layers contains a light-sensitive silver halide photographic emulsion, the light-sensitive silver halide photographic emulsion comprising light-sensitive silver halide grains mainly composed of (100) planes and (111) planes, at least one compound that is adsorbed selectively on the (100) planes of the silver halide grains, and at least one spectrally sensitizing dye that is adsorbed selectively to (111) planes of the silver halide grains, wherein tabular grains having an aspect ratio in the range of 2 to 100 amount to at least 50% of all the silver halide grains in number and dislocation lines are observed in the tabular grains.
A light-sensitive silver halide photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support, wherein at least one of silver halide emulsion layers contains a light-sensitive silver halide photographic emulsion, which emulsion comprises silver halide grains mainly composed of (100) planes and (111) planes, at least one compound that is adsorbed selectively on the (100) planes of the silver halide grains, and at least one spectrally sensitizing dye that is adsorbed selectively to (111) planes of the silver halide grains,
- wherein tabular grains having an aspect ratio of 2 to 100, amount to at least 50% of all the silver halide grains in number,
- dislocation lines are observed in the tabular grains, and
- the tabular grains comprise (111) planes and side planes having (100) planes, and have been subject to reduction sensitization.
A silver halide photographic light sensitive material, comprising at least one silver halide emulsion in a light sensitive layer, wherein said at least one silver halide emulsion has light-sensitive silver halide grains mainly composed of (100) planes and (111) planes, at least one compound that is adsorbed selectively on the (100) planes of the silver halide grains, and at least one spectrally sensitizing dye that is adsorbed selectively to (111) planes of the silver halide grains, wherein tabular grains having an aspect ratio in the range of 2 to 100 amount to at least 50% of all the silver halide grains in number, dislocation lines are observed in the tabular grains, and the tabular grains are composed of principal planes and side planes, wherein the side planes comprise (100) planes;
- and
- wherein said at least one silver halide layer is prepared by allowing, in a step of forming silver halide grains having a thickness in the range of 0.01 .mu.m to 0.30 .mu.m, a compound that will be adsorbed more selectively on the (100) planes of said silver halide grains than on the (111) planes of said silver halide grains, to be present during the formation of the said grains.
Dependencies are inferred from the claim text.