Shallow junction formation by out-diffusion from a doped dielectric layer through a salicide layer

A method of manufacturing a semiconductor device, which method comprises the steps of:

• forming a metal layer on a surface of a first conductivity type region of a silicon-containing semiconductor substrate;
• heating to convert said metal layer to an electrically conductive metal silicide layer, said metal silicide layer penetrating into and having a lower surface in contact with underlying silicon of said silicon-containing substrate region;
• forming a layer of a dielectric material over said metal silicide layer;
• ion-implanting dopant impurities of second, opposite conductivity type into said dielectric layer;
• and
• heating to out-diffuse the implant dopant impurities from the dielectric layer through the underlying metal silicide layer into the silicon-containing substrate region to form a substantially constant thickness, heavily doped layer of second conductivity type beneath and in conformal contact with said metal silicide-layer, said heavily doped layer of second conductivity type forming an ultra-shallow depth junction with said first conductivity type region of said silicon-containing substrate and said metal silicide layer forming a self-aligned, low sheet resistance ohmic contact to said heavily doped layer.