Apparatus for forming films of a semiconductor device, a method of manufacturing a semiconductor device, and a method of forming thin films of a semiconductor

A film forming apparatus for use in a semiconductor manufacturing process including a chamber in which a carbon compound film is formed on a substrate to be processed, wherein the chamber at least includes:

• a holder section for holding the substrate thereon;
• a ring-shaped member disposed to oppose a surface of the holder on a side thereof on which the substrate is mounted, the ring-shaped member holding the substrate in cooperation with the holder;
• and
• reactive gas supplying means for supplying a predetermined type of reactive gas into the chamber,
• the ring-shaped member dimensionally having an inside edge with an inside diameter smaller than an outside diameter of the holder section and an outside edge with an outside diameter larger than the outside diameter of the holder section and an upper surface with a constant slope extending from said outside edge to said inside edge, and
• the ring-shaped member concentrically covering, during a film forming process with the reactive gas, a circumferential region of a surface of the substrate mounted on the holder section.