Support frame for substrates
AssigneeApplied Komatsu Technology, Inc.
InventorsJohn M. White, Larry Chang, Emanuel Beer
Life of this patent
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Abstract
The present invention generally provides a system and method for supporting a substrate having a support frame that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more longitudinal members coupled to one or more transverse members. The transverse members preferably define a supporting surface on which a heated susceptor is mounted. The longitudinal member is preferably disposed below the heated susceptor, thus minimizing thermal expansion of the longitudinal member. Spacers made of thermally conductive material may be disposed at appropriate locations along the members to provide more uniform distribution of heat within the members.
Claims22
A substrate processing system, comprising:
- a) at least one chamber;
- b) a robot disposed in proximity to the chamber;
- and
- c) a support frame for supporting a susceptor having at least one longitudinal member and a plurality of transverse members coupled to the longitudinal member, the transverse members arranged to define at least one lateral space therebetween.
An apparatus for supporting a susceptor in a substrate processing system, comprising a support frame having at least one longitudinal member supporting a plurality of transverse members, the transverse members arranged to define at least one space therebetween.
A system for supporting a susceptor with a support frame in a substrate processing system, the support frame comprising:
- a) at least one longitudinal member;
- and
- b) a plurality of transverse members coupled to the longitudinal member, at least a portion of the transverse members being disposed between the susceptor and the longitudinal member.
Dependencies are inferred from the claim text.