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US 6,149,078 AGranted
Slurry nozzle
AssigneeMosel Vitelic, Inc.
InventorsDong-tay Tsai, Hua-jen Tseng, Chun-chieh Lee, Yi-hua Chin
Life of this patent
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Abstract
A slurry nozzle for supplying slurry in chemical mechanical polishing (CMP) including at least one slurry line, a slurry nozzle enclosure for accommodating the slurry line, and a baffle ring mounted at one end of the slurry nozzle enclosure. A plurality of apertures is formed on the sidewall of the slurry line for the slurry to spray out. The slurry spraying out from the slurry line flows down along the inner sidewall of the slurry baffle ring after the slurry impinges onto the slurry baffle ring.
Claims2
A slurry nozzle for supplying slurry in chemical mechanical polishing (CMP), comprising:
- at least one slurry line having a sidewall for the slurry to spray out;
- a slurry nozzle enclosure for accommodating said at least one slurry line;
- and
- a baffle ring mounted at one end of the slurry nozzle enclosure from which the slurry flows out, having an inner sidewall enclosing the slurry line,
- wherein said at least one slurry line is provided with a plurality of apertures formed on said sidewall of said at least one slurry line for the slurry to spray;
- and the slurry spraying out from said slurry line flows down along said inner sidewall of said slurry baffle ring after the slurry impinges onto said slurry baffle ring.
3 more elements
Dependencies are inferred from the claim text.