Plasma processing apparatus
AssigneeFrontec Incorporated
InventorsKoichi Fukuda, Sung Chul Kim, Akira Nakano
Life of this patent
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Abstract
A plasma processing apparatus for stably and uniformly performing various kinds of processing by preventing unnecessary plasma discharge in the processing comprises a susceptor pin for supporting a substance to be processed, the susceptor pin being disposed to pass through a hole formed to a susceptor, projecting from the upper surface of the susceptor when the susceptor falls and falling by its own weight when the susceptor rises so as to be buried in the hole, and a guide for guiding the rising and falling directions of the susceptor pin, wherein the susceptor pin and the guide are composed of ceramics.
Claims6
A plasma processing apparatus, comprising:
- a susceptor pin for supporting a substance to be processed, said susceptor pin being disposed to pass through a hole formed to a susceptor, projecting from the upper surface of the susceptor when the susceptor falls and falling by its own weight when the susceptor rises so as to be buried in the hole said susceptor pin comprising a pin main body and a shaft engaged with the pin main body so that the shaft can be adjusted to freely expand and contract;
- an expanded diameter portion formed to said shaft by expanding a part of said shaft, said guide comprised of an upper guide and a lower guide detachably attached to the upper guide, and a stopper disposed to the lower guide so that the stopper is abutted against and supports said shaft when said susceptor pin falls;
- and
- a guide for guiding the rising and falling directions of said susceptor pin,
- wherein said susceptor pin and said guide are composed of ceramics.
Dependencies are inferred from the claim text.