Bipolar transistor and manufacturing method for same
AssigneeNEC Corporation
InventorShinichi Tanaka
Life of this patent
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Abstract
In an element intrinsic region 12 of a bipolar transistor, an emitter is formed by two emitter layers 31,32 so as to reduce the potential barrier presented to minority carriers, this resulting in a smooth flow of minority carriers that are injected into the base layer from the emitter, and in the element external region 13, the emitter layer 32 that acts to reduce the potential barrier to injected minority carriers is removed, thereby suppressing the injection of minority carriers from the emitter layer 31 into the base layer.
Claims3
A bipolar transistor which has an emitter contact layer formed on a semiconductor substrate, an emitter layer formed onto said emitter contact layer, a base layer that serves as a transistor region and an external base layer that serves as an external base region formed over said emitter layer, and a collector layer that is formed onto said base layer, said layers being formed in this sequence, wherein said bipolar transistor being provided with a buffer emitter layer in said emitter layer of a transistor region that makes contact with said base layer, thereby the effective energy barrier of minority carriers that are injected from said emitter layer into said base layer is lowered, and the energy barrier of minority carriers that are injected from said emitter layer into said external base region is increased without providing said buffer emitter layer in a transistor external region that is adjacent to said transistor region, and further wherein an energy band gap of said buffer emitter layer is a width that is between said energy band gap of said base layer and an energy band gap of said external base layer.
Dependencies are inferred from the claim text.