Pattern forming method
AssigneeKabushiki Kaisha Toshiba
InventorsAtsushi Ando, Kazuyoshi Sugihara, Katsuya Okumura, Tetsuro Nakasugi
Life of this patent
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Abstract
To achieve down-sizing and improvements of throughputs, light exposure and charge beam exposure are sometimes used together. In case of performing exposure of a desired pattern in a plurality of stages, a positional displacement of each of exposure patterns in the stages leads to a decrease in exposure accuracy. According to the present invention, in case of forming a fine pattern by exposure after exposure of a rough pattern, the exposure position of the rough pattern is adjusted, based on a latent image of the rough pattern which has been subjected to exposure. As a result, a positional displacement between rough and fine patterns is reduced so that a desired pattern can be formed with high accuracy.
Claims8
An exposure apparatus for forming a desired pattern by exposing a sensitive material coated on a substrate, comprising:
- a first optical system for transferring a first pattern by exposing the sensitive material;
- a second optical system for transferring a second pattern by exposing the sensitive material, the desired pattern being expressed as a synthesized pattern consisting of the first and second pattern;
- and
- a controller for adjusting an exposure position of the second pattern, based on a latent image of the first pattern formed in the sensitive material.
An exposure apparatus comprising:
- a first optical system for transferring a desired pattern by exposing a sensitive material;
- and
- a controller for adjusting an exposure position of the desired pattern, based on a surface pattern of a substrate below the sensitive material.
A lithography system comprising:
- a coating/developing device for coating a sensitive material on a substrate and for developing the sensitive material in which a desired pattern is transferred by exposure;
- a light stepper for transferring a first pattern by exposing the sensitive material;
- a charge beam exposure device for transferring a second pattern by exposing the sensitive material, the desired pattern being expressed as a synthesized pattern consisting of the first and second patterns;
- an optical system for detecting a latent image of the first pattern formed in the sensitive material exposed by the light stepper;
- and
- a controller for adjusting an exposure position of the second pattern, based on a position of the latent image detected.
A lithography system comprising:
- a coating/developing device for coating a sensitive material on a substrate and for developing the sensitive material in which a desired pattern is transferred by exposure;
- a charge beam exposure device for transferring the desired pattern by exposing the sensitive material;
- an optical system for detecting a surface pattern of the substrate below the sensitive material;
- and
- a controller for adjusting an exposure position of the desired pattern, based on a position of the surface pattern detected.
Dependencies are inferred from the claim text.