Resist processing system and resist processing method

A resist processing apparatus for performing a resist process on a substrate, comprising:

• a coating unit for coating a resist film on surface of the substrate;
• an interface unit for passing a substrate between the interface unit itself and an exposure device;
• a heat treatment unit for carrying out a heat treatment on said substrate having the surface on which the resist film is formed by the coating unit, said resist film being exposed to light by the exposure device;
• a cooling unit for cooling said substrate on which the heat treatment was carried out by said heat treatment unit;
• a development unit for developing said resist film formed on the surface of said substrate which was cooled by said cooling unit;
• substrate carrying means for carrying said substrate between said heat treatment unit, said cooling unit, said development unit and said interface unit;
• and
• a control unit configured to control an operation of at least said heat treatment unit and said substrate conveying means and of changing a required time for a post-exposure-baking process at said heat treatment unit in accordance with a required time for a process of said substrate at said exposure device.