Detergent for processes for producing semiconductor devices or producing liquid crystal devices
AssigneesKishimoto Sangyo Co., Ltd., Otsuka Chemical Co., Ltd.
InventorsTakashi Yata, Yutaka Koinuma, Kazunori Fukumura, Yoshihito Fukumura
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Abstract
The cleaner of the present invention contains, as an active ingredient, a polyphosphoric-acid-urea condensate or phosphoric-acid-urea polymer which is a reaction product from orthophosphoric acid and urea and is used for cleaning a metal surface and/or a glass surface in at least one process of a semiconductor device production process and a liquid crystal device production process. According to the present invention, an etching residue and impurities on metal (including semimetal) and glass surfaces can be cleaned off with high environmental and working safety and effectively without causing the problem of metal corrosion.
Claims9
A process for cleaning a metal and/or a glass surface comprising cleaning said surface with a cleaner which contains, as an active ingredient, a polyphosphoric acid-urea condensate or phosphoric acid-urea polymer, which is a reaction product of orthophosphoric acid and urea, wherein the surface is of a semi-conductor device or a liquid crystal device and wherein an etching residue containing an organometal formed during an etching process and a metal oxide formed from the organometal is removed.
Dependencies are inferred from the claim text.