Resist polymer and chemical amplified resist composition containing the same
AssigneeKorea Kumho Petrochemical Co., Ltd.
InventorsDong-Chul Seo, Sun-Yi Park, Joo-Hyeon Park, Seong-Ju Kim
Life of this patent
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Abstract
A copolymer represented by the formula I and a chemical amplification resist containing the copolymer, which can be easily controlled in sensitivity by regulating the content and kind of the norbornene derivatives in the matrix polymers in addition to being superior in adherence to substrate and dry etch resistance: ##STR1## wherein, X is selected from the group consisting of the following general formulas II, III and IV; and, l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=1 and 0.4.ltoreq.o.ltoreq.0.5: ##STR2##
Claims5
A copolymer, represented by the following general formula I:
- ##STR34## wherein, X is selected from the group consisting of the following general formulas II, III and IV:
- ##STR35## wherein R.sub.1 is selected from the group consisting of straight or branched alkyl groups, cyclic or polycyclic alkyl groups, alkyl carbonyl groups, branched alkyl carbonyl groups, and cyclic or polycyclic alkyl carbonyl groups, all containing 1-10 carbon atoms;
- R.sub.2, R.sub.3 and R.sub.4 are independently selected from the group consisting of straight or branched alkyl groups, and cyclic or polycyclic alkyl groups, all containing 1-10 carbon atoms;
- and
- l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=1 and 0.4.ltoreq.o.ltoreq.0.5.
A chemical amplification resist composition, comprising;
- a copolymer represented by the following general formula I:
- ##STR36## wherein, X is selected from the group consisting of the following general formulas II, III and IV:
- ##STR37## wherein R.sub.1 is selected from the group consisting of straight or branched alkyl groups, cyclic or polycyclic alkyl groups, alkyl carbonyl groups, branched alkyl carbonyl groups, and cyclic or polycyclic alkyl carbonyl groups, all containing 1-10 carbon atoms;
- R.sub.2, R.sub.3 and R.sub.4 are independently selected from the group consisting of straight or branched alkyl groups, and cyclic or polycyclic alkyl groups, all containing 1-10 carbon atoms;
- and
- l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=1 and 0.4.ltoreq.o.ltoreq.0.5;
- a photoacid generator;
- and
- a solvent.
Dependencies are inferred from the claim text.