Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems
AssigneeArch Specialty Chemicals, Inc.
InventorsUlrich Schaedeli, Andrew J. Blakeney, Thomas Steinhausler, Daniela White, Allen H. Gabor
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Abstract
A terpolymer with chemically amplified (acid labile) moieties and organosilicon moieties suitable for use as the binder resin for a photoimageable resist photoresist composition suitable for use in 193 nm photolithographic processes. The terpolymers have the following structural units: ##STR1## where R is a methyl or hydroxyethyl group, R.sup.1 is a hydrogen atom, a methyl group or a --CH.sub.2 COOCH.sub.3 group and R.sup.2 and R.sup.3 are each independently a hydrogen atom or a methyl group.
Claims18
A radiation-sensitive terpolymer comprising recurring units of the formulae
- about 1 to 55 wt % of units of the formula ##STR5## about 35 to 77 wt % of units of the formula ##STR6## and about 16 to 40 wt % of units of the formula ##STR7## based on the weight of the polymer, and wherein R is a methyl or hydroxyethyl group, R.sup.1 is a hydrogen atom, a methyl group or a CH.sub.2 COCH.sub.3 group, and R.sup.2 and R.sup.3 are each independently selected from a hydrogen atom or a methyl group.
A radiation-sensitive composition comprising:
- a terpolymer having recurring units of the formulae
- about 1 to 55 wt % of units of the formula ##STR8## about 35 to 77 wt % of units of the formula ##STR9## and about 16 to 40 wt % of units of the formula ##STR10## based on the weight of the polymer, and wherein R is a methyl or hydroxyethyl group, R.sup.1 is a hydrogen atom, a methyl group or a CH.sub.2 COCH.sub.3 group, and R.sup.2 and R.sup.3 are each independently selected from a hydrogen atom or a methyl group.
- a photosensitive compound which generates an acid upon exposure to actinic radiation,
- a solvent capable of dissolving the terpolymer and the photosensitive acid generating compound, said solvent being selected from ethyl lactate, propylene glycol methyl ether acetate and mixtures thereof, and
- 2,4,5-triphenylimidazole.
Dependencies are inferred from the claim text.