US 6,146,135 A · Oxide film forming method

Oxide film forming method

AssigneesTadahiro Ohmi, Takasago Netsugaku Kogyo Kabushiki Kaisha

InventorsJinzo Watanabe, Takeo Yamashita, Masakazu Nakamura, Shintaro Aoyama, Hidetoshi Wakamatsu, Tadashi Shibata, Tadahiro Ohmi, Nobuhiro Konishi, Mizuho Morita, Hisayuki Shimada, Takashi Imaoka

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Abstract

Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressure in the vessels are reducible respectively. The vessels are so configured that objects to be processed are movable among them, and there is provided light projection means for projecting ultra rays on gases introduced to at least of the vessels.

Claims9

Dependent claims

A gas drier comprising:

gas supply means for supplying a specified gas to flow over an object to be dried, and
irradiating means for ionizing with an ultra-violet ray a portion of said gas creating an ionized gas to flow over the object to be dried preventing a buildup of static electricity.

Dependencies are inferred from the claim text.

Facts

Application

08/680,519Filed 9 Jul 1996 · division

Priority

JP 3-23093919 Aug 1991

Granted

14 Nov 2000

Term ends

Not estimatedThe source records don’t support an estimate.

Classification13 codes

C30B 23/02
Single-crystal growth by condensing evaporated or sublimed materials: epitaxial-layer growth
C23C 8/10
Only one element being applied: oxidising
C23C 8/36
Using gases: using ionised gases, e.g. ionitriding
C23C 14/022
Cleaning or etching treatments: by means of bombardment with energetic particles or radiation