Apparatus for processing substrates in a fluid tank
AssigneeSteag MicroTech GmbH
InventorRobin Schild
Life of this patent
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Abstract
An apparatus for the processing of substrates in a fluid tank is provided. The fluid tank has at least one fluid inlet opening and at least one overflow opening in the upper region of at least one side wall of the fluid tank. Optimum adaptation to fluid circulation rates is provided by at least one slide having a variable position relative to the overflow opening for varying the opening area thereof. This opening area is smaller during introduction of gas than during a preceding rinsing process.
Claims7
An apparatus for processing substrates in a fluid tank having at least one fluid inlet opening and at least one overflow opening in an upper region of at least one side wall of said fluid tank, said apparatus comprising:
- a hood that during a drying process is disposed above said fluid tank for the introduction of a gas;
- and
- at least one slide means having a variable position relative to said at least one overflow opening for varying an opening area of said at least one overflow opening, wherein said opening area is smaller during introduction of gas than during a preceding rinsing process.
Dependencies are inferred from the claim text.