Control process and device for treating the surface of a solid substrate

A control device for operation of a system for treating a surface of a solid running substrate by dielectric-barrier electrical discharge in a controlled gaseous atmosphere, comprising

• (A) a system which includes (i) a treatment device through which a substrate to be treated runs at a speed, (ii) means connected to said treatment device for supplying the treatment device with a flow of gas, (iii) means connected to said treatment device for supplying the treatment device with electrical power in order to produce the electrical discharge and (iv) gas suction means,
• (B) a data processing unit capable of receiving, as input, a datum regarding the speed at which the substrate is running through the treatment device while being treated, the data processing unit further comprising an output side connected to a means for controlling the gas supply means and to means for controlling the electrical power supply means, in order to regulate the flow of gas delivered by the or each of the gas supply means and/or the electrical power delivered by the electrical power supply means to the device as a function of the speed at which the substrate is running through the treatment device while being treated, so as to obtain a surface treatment of the substrate with an equivalent quality whatever the speed at which the substrate is running through the treatment device.