Apparatus and method for generating a plasma from an electromagnetic field having a lissajous pattern
AssigneeMicron Technology, Inc.
InventorKie Y. Ahn
Life of this patent
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Abstract
An apparatus for forming an electromagnetic field in a processing chamber, including a first pair of electrodes for generating a first electromagnetic field within the processing chamber and a second pair of electrodes for generating a second electromagnetic field within the processing chamber. The first and second pairs of electrodes are oriented so that the first and second electromagnetic fields are oriented generally perpendicular to each other. When energized, the first and second electromagnetic fields combine and may take the form of a lissajous pattern. When a gas is exposed to the combined electromagnetic field a plasma may be formed in the general shape of the combined electromagnetic field.
Claims27
An apparatus for forming an electromagnetic field in a processing chamber, comprising:
- a first pair of electrodes oppositely disposed at opposite sides of the processing chamber;
- a second pair of electrodes oppositely disposed at opposite sides of the processing chamber, the first arid second pairs of electrodes being oriented so that a first electromagnetic field generated between the first pair of electrodes and a second electromagnetic field generated between the second pair of electrodes are oriented generally perpendicular to each other;
- and
- a power supply connected to said first and second pairs of electrodes, wherein the power supply supplies a first signal having a first amplitude to the first pair of electrodes and a second signal having a second amplitude to the second pair of electrodes, wherein the first amplitude does not equal the second amplitude.
An apparatus for generating an electromagnetic field, comprising:
- a processing chamber;
- a first pair of electrodes oppositely disposed at opposite sides of said processing chamber;
- a second pair of electrodes oppositely disposed at opposite sides of said processing chamber, the first and second pairs of electrodes being oriented so that a first electromagnetic field generated between the first pair of electrodes and a second electromagnetic field generated between the second pair of electrodes are oriented generally perpendicular to each other;
- and
- a power supply connected to said first and second pairs of electrodes, wherein the power supply supplies a first signal having a first amplitude to the first pair of electrodes and a second signal having a second amplitude to the second pair of electrodes, wherein the first amplitude does not equal the second amplitude.
A system for processing semiconductor wafers, comprising:
- a processing chamber;
- a first pair of electrodes oppositely disposed at opposite sides of the processing chamber;
- a second pair of electrodes oppositely disposed at opposite sides of the processing chamber, the first and second pairs of electrodes being oriented so that a first electromagnetic field generated between the first pair of electrodes and a second electromagnetic field generated between the second pair of electrodes are oriented generally perpendicular to each other;
- a power supply connected to said first and second pairs of electrodes, wherein the power supply supplies a first signal having a first amplitude to the first pair of electrodes and a second signal having a second amplitude to the second pair of electrodes, wherein the first amplitude does not equal the second amplitude;
- a wafer holder within said processing chamber;
- a sealable door in said processing chamber;
- and
- a source of deposition material within said chamber.
A method for generating an electromagnetic field within a processing chamber, comprising:
- energizing a first pair of electrodes with a first energizing signal having a first amplitude, wherein the first pair of electrodes are oppositely disposed at opposite sides of the processing chamber such that the first pair of electrodes produce a first electromagnetic field in the processing chamber;
- and
- energizing a second pair of electrodes with a second energizing signal having a second amplitude, wherein the second pair of electrodes are oppositely disposed at opposite sides of the processing chamber such that the second pair of electrodes produce a second electromagnetic field in the processing chamber perpendicular to the first electromagnetic field, and wherein the first amplitude does not equal the second amplitude.
A method for generating an electromagnetic field within a processing chamber, comprising:
- oppositely disposing a first pair of electrodes at opposite sides of the processing chamber;
- oppositely disposing a second pair of electrodes at opposite sides of the processing chamber;
- energizing the first pair of electrodes with a first energizing signal having a first amplitude;
- and
- energizing the second pair of electrodes with a second energizing signal having a second amplitude, wherein the first amplitude does not equal the second amplitude.
Dependencies are inferred from the claim text.